- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/207 - Means for focusing, e.g. automatically
Patent holdings for IPC class G03F 7/207
Total number of patents in this class: 40
10-year publication summary
3
|
3
|
2
|
5
|
2
|
3
|
1
|
0
|
0
|
0
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Nikon Corporation | 7162 |
6 |
FUJIFILM Corporation | 27102 |
3 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
2 |
ASML Netherlands B.V. | 6816 |
2 |
Dai Nippon Printing Co., Ltd. | 3891 |
2 |
Northwestern University | 3112 |
2 |
Shanghai Micro Electronics Equipment (Group) Co., Ltd. | 243 |
2 |
International Business Machines Corporation | 60644 |
1 |
Panasonic Corporation | 20786 |
1 |
ASML Holding N.V. | 542 |
1 |
Cymer, LLC | 347 |
1 |
Carl Zeiss SMT GmbH | 2646 |
1 |
Fujikura Ltd. | 2777 |
1 |
Asahi Kasei E-materials Corporation | 222 |
1 |
Dexerials Corporation | 1826 |
1 |
Eran & Jan, Inc | 2 |
1 |
Esko-Graphics Imaging GmbH | 77 |
1 |
GLOBALFOUNDRIES U.S. Inc. | 6459 |
1 |
Prodways | 7 |
1 |
Screen Holdings Co., Ltd. | 2431 |
1 |
Other owners | 8 |